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              CH / EN

              PRODUCT

              Available Systems

              BACK

              Product Introduction

              ASML’s PAS 2500/40 stepper with a well proven Zeiss 0.40NA i-line lens with a 21.1mm image field diameter. PAS 2500/40 stepper has been designed for 0.7micron production resolutions using a “process in-depended” alignment system, for a superior production overlay., makes the system a well proven workhorse.
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              ASML PAS2500/40 i-line wafer stepper:

              • Lens resolution 0.7 micron i-line (365nm)

              • Reduction 5X

              • Field size 21.2 mm dia ( Xmax= 15mm, Ymax= 19mm )

              • UDOF 2.1micron ( Slope > 83 degrees )

              • Uniformity ± 3%

              • Intensity 200 - 420 mW/c㎡ (PEP option depended)

              • Reticles 6 (5”), automatic exchange and masking

              • Wafers 100, 125, 150 mm

              • Overlay (99.7% of data)
                single machine < 150 nm
                mach. to ref. mach < 250 nm
                mach. to mach < 300 nm

              • Throughput at 100 mJ/cm
                6”, 55 exp. 47 - 70 WPH (PEP option depended )
                5”, 35 exp. 60 - 89 WPH(PEP option depended )
                4”, 21 exp. 74 – 109 WPH(PEP option depended )

              • TEL

                +86 21 67693080

              • E-MAIL

                sales@simaxat.com

              Simax Shanghai Company Limited
              ADDRESS:No.255, SizhuanNan Road, Building 130,
              Songjiang district,Shanghai,China.201612.
              WeChat

              ALL RIGHTS RESERVED ?2021 Simax Shanghai Company Limited 滬ICP備18039044號-1

              滬公網安備 31011702008159號

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